专利名称：Photoprotector and/or
photoimmunoprotector compositions of theskin and their uses
发明人：Antonio Guerrero Gomez-Pamo,Marta
Dominguez Valdes-Hevia,Aurora Ma BrievaDelgado,Fernando Garcia Martinez,Jose LuisAlonso Lebrero,Salvador GonzalezRodriguez,Juan Pablo PivelRaviery,Madhukar A. Pathak
申请号：US11541350申请日：20060929
公开号：US20070025933A1公开日：20070201
摘要：The composition comprises of a component A selected from a hydroxylatedderivative of benzoic acid or of cinamic acid, their esters, amides or salts, a glycoside of ahexose, and their mixtures; and a component B selected from quinic acid, shikimic acid,their alkaline metal or alkaline earth salts, their methyl esters, and mixtures of the same.This composition is suitable for protecting the skin against ultraviolet radiation comingfrom the sun or artificial sources, such as those used in phototherapy units and in suntanning rooms. For application in the field of dermatology and nutrition, and, in particular,in the photoprotection of the skin and mucosa, photo-ageing and photocarcinogenesis,including protection of the immune system associated with the skin.
申请人：Antonio Guerrero Gomez-Pamo,Marta Dominguez Valdes-Hevia,Aurora Ma
Brieva Delgado,Fernando Garcia Martinez,Jose Luis Alonso Lebrero,Salvador GonzalezRodriguez,Juan Pablo Pivel Raviery,Madhukar A. Pathak
地址：Madrid ES,Madrid ES,Madrid ES,Madrid ES,Madrid ES,Madrid ES,Pozuelo deAlarcon ES,Belmont MA US
国籍：ES,ES,ES,ES,ES,ES,ES,US
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