专利名称:Power supply, a semiconductor making
apparatus and a semiconductor waferfabricating method using the same
发明人:Youji Takahashi,Tsutomu Iida,Tsuyoshi
Umemoto,Makoto Kashibe
申请号:US10082160申请日:20020226公开号:US06713885B2公开日:20040330
专利附图:
摘要:In power supply and a semiconductor making apparatus and a semiconductor
fabricating method using the same, an abnormality can be detected when an offsetoccurs in a part constituting a closed-loop system of high-frequency power supply or dcpower supply for a semiconductor making apparatus. Power supply for receiving a powervalue setting signal to set strength of power and a power on/off instruction to set on oroff of outputting of the power interrupts the supply of the power even in a state in whicha subsequent power on/off instruction is on if a power sense signal according to a valueobtained by sensing the power exceeds a predetermined value when the power on/offinstruction is off.
申请人:HITACHI HIGH-TECHNOLOGIES CORPORATION
代理机构:Antonelli, Terry, Stout & Kraus, LLP
更多信息请下载全文后查看
因篇幅问题不能全部显示,请点此查看更多更全内容